Proteus UV/Ozone cleaning system is a tool designed for surface
cleaning and curing of any kind of surface, and in particular
for surfaces
to be decontaminated by organic residues before wire
bonding.
Wafers can also be cured by UV-Ozone to remove reist
residues or to enhance oxide thickness in epitaxy.
UV/Ozone system is based on high frequency UV lamps
and features a controlled irradiation.
Ozone oxidates residues on part surface, and
UV/C irradiation will produce a surface curing and decontamination.
To prepare surfaces for wire bonding, such as in COB processes,
where plastic parts have to be assembled
together with special glues or resins, like in packaging
technology, to remove resist residues from wafers or when a metal part have to be cleaned
and decontaminated from organic residues without
aggressive chemicals or mechanical actions, Proteus
UV/Ozone cleaner can be the right solution.
UV is a cost effective alternative to plasma etching,
since it is not required any special vacuum chamber,
nor gases or special facilities.
UV-Ozone cleaning can also be arranged to make cleaning
lines with continuous loading, and can be coupled to
a DI water rinse system to completely remove particles
from surfaces.
The benchtop version is equipped with high pressure, high frequency
UV tubes, with electronic ballasts and a motorized platform
to drive parts into the cleaning chamber.
Safety sensors will avoid ozone environment contamination
and UV exposition to the operator.
Control interface is extremely simple and user friendly, not
requiring any special training for operators.
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